with the collaboration of Iranian Society of Mechanical Engineers (ISME)

Document Type : Research Article-en

Authors

Department of Mechanical Engineering of Biosystems, Faculty of Agriculture, University of Jiroft, Jiroft, Iran

Abstract

In the current study, the modeling and optimization of various seedling growth and germination indices for parsley seeds were investigated. A lab-scale quadrupole magnetic field was developed, and experiments were conducted using a completely randomized factorial design with three replications. The factors considered were magnetic field intensity (150, 300, and 450 mT), exposure time (30, 60, and 90 minutes), and culture time (0, 7, and 14 days after applying the magnetic field). The results revealed that the magnetic field significantly affected shoot length, fresh root weight, and fresh shoot weight, while exposure time significantly impacted root length. Sowing day also significantly influenced root length and fresh root weight, along with other factors. Immediate sowings after magnetic field application enhanced root length, while sowing 14 days following the exposure increased shoot length, fresh root weight, and fresh shoot weight. A 30-minute exposure to magnetic field intensities of 150 to 300 mT did not significantly affect seedling growth parameters. However, higher field strengths of 450 mT for 60 to 90 minutes proved beneficial, leading to enhanced shoot length, fresh root weight, fresh shoot weight, germination rate, germination percentage, and reduced mean germination time. The analysis and optimization using Response Surface Methodology revealed that the optimal magnetization condition, with a desirability of 0.682, was achieved at a magnetic field of 450 mT, an exposure time of 60 minutes, and sown 14 days post-exposure. Higher magnetic fields appeared to enhance field durability and significantly impact seedling growth indices.

Keywords

Main Subjects

©2025 The author(s). This is an open access article distributed under Creative Commons Attribution 4.0 International License (CC BY 4.0).

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